Amat P5000 Cvd Manual

HORIBA STEC SEC-Z500 SERIES MFC'S Multi-gas, multi-range Digital Mass Flow Controllers High accuracy for all ranges (+/- 1.0% S.P.) with piezo actuator valve. High speed response: 1 second response time between any two setpoints, and all-metal design. Standard sizes used for EPI and other processes in stock. Digital / Analog communications models only in stock. Models with 1/4' & 1/2' VCR fittings only in stock. Some models avaialble with Normally Open (N/O) valves.

The Applied Materials P5000 is a plasma enhanced chemical vapor deposition (PECVD) system designed to deposit thin film dielectrics and doped and undoped silicon containing semiconductor films from gas sources reacted in a plasma to form a conformal and uniform film.

P5000

Please specify gas and flow rate when ordering. Same day shipping available.

Precision 5000 ®The Precision 5000® is a single-wafer, multi-chamber platform for sequential wafer processing. The platform supportssequential processing of wafers ranging in size from 4', 5', 6', or 8'.The platform supports up to 4 separate process chambers. Wafers are processed in a low vacuum environment.The multi-chamber design of this platform allows for individual processes in each of the four chambers.The following chamber types can be added to the system:Lamp Heated CVD - Processes include: SACVD, BWCVD, WCVD, TEOS, NitridePE TEOS DxZ - DxZ chamber design for better process control for Plasma Enhanced TEOS applications.PE Silane DxZ - DxZ chamber design for better process control for Plasma Enhanced Silane based applications.Tungsten WxZ - Tungsten deposition chamber designed for zero edge exclusion.

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